Comparison of chelating ability of NO-, NS-, ONS-, and ONO-type Schiff base derivatives and their stability constants of Bis-complexes with copper(II)

Authors : Hasan ATABEY, Esra FINDIK, Hayati SARI, Mustafa CEYLAN

Pages : 109-120

Doi:10.3906/kim-1303-65

View : 11 | Download : 3

Publication Date : 0000-00-00

Article Type : Research Paper

Abstract :The present study includes important findings relating to the number of donor atoms, species of ligands, and stabilities of complexes. Stabilities of complexes between Cuinsert ignore into journalissuearticles values(II); ion and NO-, NS-, ONS-, and ONO-type Schiff bases were compared. Acid-base properties of the Schiff bases were explained at 25 \pm 0.1 °C and ionic strength insert ignore into journalissuearticles values(I); of 0.1 M supported by NaCl. The Hyperquad computer program was used for calculation of dissociation and stability constants. The overall stability constants of their Cuinsert ignore into journalissuearticles values(II); complexes were calculated and the various formed complexes between the Schiff bases with Cuinsert ignore into journalissuearticles values(II); ion formulated as CuL2, CuHL2, CuH2L2, and CuH-1L2 insert ignore into journalissuearticles values(Cu insert ignore into journalissuearticles values(OH); L2);. The complexes of ONS- and ONO-type tridentate ligands were more stable than those of NO- and NS-type bidentate ligands.
Keywords : Schiff bases, potentiometric titration, Hyperquad, stability constants